Monomer, polymer, chemically amplified negative resist composition, and resist pattern forming process
US-2025044689-A1 · Feb 6, 2025 · US
having unsaturation outside the aromatic rings · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C07C43/176 |
| Official title | having unsaturation outside the aromatic rings |
| Display label | having unsaturation outside the aromatic rings |
| Total patents | 34 |
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is rapidly declining.
| Year | Patents |
|---|---|
| 2015 | 3 |
| 2016 | 4 |
| 2017 | 4 |
| 2018 | 2 |
| 2019 | 2 |
| 2020 | 2 |
| 2021 | 5 |
| 2022 | 5 |
| 2023 | 2 |
| 2024 | 4 |
| 2025 | 1 |
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
US-2025044689-A1 · Feb 6, 2025 · US
US-12139454-B2 · Nov 12, 2024 · US
US-2024329532-A1 · Oct 3, 2024 · US
US-2024190797-A1 · Jun 13, 2024 · US
US-11932596-B2 · Mar 19, 2024 · US
US-2023144907-A1 · May 11, 2023 · US
US-11560347-B2 · Jan 24, 2023 · US
US-2022378675-A1 · Dec 1, 2022 · US
US-2022324783-A1 · Oct 13, 2022 · US
US-11384043-B2 · Jul 12, 2022 · US
US-11382848-B2 · Jul 12, 2022 · US
US-11358922-B2 · Jun 14, 2022 · US
US-2021284593-A1 · Sep 16, 2021 · US
US-11072744-B2 · Jul 27, 2021 · US
US-11021413-B2 · Jun 1, 2021 · US
US-2021047192-A1 · Feb 18, 2021 · US
US-2021017112-A1 · Jan 21, 2021 · US
US-2020331829-A1 · Oct 22, 2020 · US
US-2020115633-A1 · Apr 16, 2020 · US
US-2019374451-A1 · Dec 12, 2019 · US
Answers are generated from the same data shown on this page.