Benzenesulfonic acid salt compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process
US-2025383600-A1 · Dec 18, 2025 · US
containing halogen atoms bound to the carbon skeleton
containing halogen atoms bound to the carbon skeleton · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C07C309/39 |
| Official title | containing halogen atoms bound to the carbon skeleton |
| Display label | containing halogen atoms bound to the carbon skeleton |
| Total patents | 43 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is rapidly growing.
| Year | Patents |
|---|---|
| 2015 | 3 |
| 2016 | 9 |
| 2017 | 6 |
| 2018 | 5 |
| 2019 | 5 |
| 2020 | 4 |
| 2021 | 1 |
| 2022 | 3 |
| 2023 | 2 |
| 2024 | 2 |
| 2025 | 3 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Onium salt monomer, polymer, chemically amplified resist composition, and pattern forming process
US-2025244665-A1 · Jul 31, 2025 · US
Photoacid generator
US-12216402-B2 · Feb 4, 2025 · US
Radiation-sensitive resin composition and pattern formation method
US-2024152048-A1 · May 9, 2024 · US
Photoacid generator
US-2024069442-A1 · Feb 29, 2024 · US
Photoacid generator
US-11846886-B2 · Dec 19, 2023 · US
Photoresist pattern trimming compositions and pattern formation methods
US-11754927-B2 · Sep 12, 2023 · US
Corrosion inhibiting coating additive
US-11365321-B2 · Jun 21, 2022 · US
Photoacid generator
US-2022163886-A1 · May 26, 2022 · US
Mono-(acid) salts of 6-aminoisoquinolines and uses thereof
US-2022144778-A1 · May 12, 2022 · US
Resist composition and resist patterning process
US-11131926-B2 · Sep 28, 2021 · US
Photoresist pattern trimming compositions and pattern formation methods
US-2020379353-A1 · Dec 3, 2020 · US
Resist composition and patterning process
US-10613436-B2 · Apr 7, 2020 · US
Resist composition and patterning process
US-10613437-B2 · Apr 7, 2020 · US
Resist composition and patterning process
US-10606172-B2 · Mar 31, 2020 · US
Mono-(acid) salts of 6-aminoisoquinolines and uses thereof
US-2019322625-A1 · Oct 24, 2019 · US
Colored composition
US-10450462-B2 · Oct 22, 2019 · US
Corrosion inhibiting coating additive
US-2019256719-A1 · Aug 22, 2019 · US
Titanium ligand-modified black phosphorus and preparation method and use thereof
US-10336615-B2 · Jul 2, 2019 · US
Resist composition and resist patterning process
US-2019010119-A1 · Jan 10, 2019 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C07C309/39?
- CPC C07C309/39 is the Cooperative Patent Classification code for “containing halogen atoms bound to the carbon skeleton.”
- How many patents are filed under CPC C07C309/39 (containing halogen atoms bound to the carbon skeleton)?
- Our database includes 43 publications tagged with this CPC code.
- Is patent activity under CPC C07C309/39 growing?
- Publication counts under this code: 2 in 2024 vs 3 in 2025 (latest complete years).