Radiation-sensitive resin composition, polymer and method for forming a resist pattern
US-9598520-B2 · Mar 21, 2017 · US
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Naruoka Takehiko — Physics
Naruoka Takehiko holds 1 patent in Physics, with representative filings summarized below.
| Metric | Value |
|---|---|
| Company | Naruoka Takehiko |
| Technology | Physics |
| Patents in slice | 1 |
| Recent patents in slice | 0 |
| First year | 2017 |
| Last year | 2017 |
Representative patents
Notable publications linking Naruoka Takehiko to Physics.
Radiation-sensitive resin composition, polymer and method for forming a resist pattern
US-9598520-B2 · Mar 21, 2017 · US
Radiation-sensitive resin composition, polymer and method for forming a resist pattern
US-9598520-B2 · Mar 21, 2017 · US
Radiation-sensitive resin composition, polymer and method for forming a resist pattern
US-9598520-B2 · Mar 21, 2017 · US
Radiation-sensitive resin composition, polymer and method for forming a resist pattern
US-9598520-B2 · Mar 21, 2017 · US
Recent filings
Latest patents from Naruoka Takehiko in Physics.
Radiation-sensitive resin composition, polymer and method for forming a resist pattern
US-9598520-B2 · Mar 21, 2017 · US
Radiation-sensitive resin composition, polymer and method for forming a resist pattern
US-9598520-B2 · Mar 21, 2017 · US
Radiation-sensitive resin composition, polymer and method for forming a resist pattern
US-9598520-B2 · Mar 21, 2017 · US
Radiation-sensitive resin composition, polymer and method for forming a resist pattern
US-9598520-B2 · Mar 21, 2017 · US
Radiation-sensitive resin composition, polymer and method for forming a resist pattern
US-9598520-B2 · Mar 21, 2017 · US
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