Adjustment and Design Method of Illumination System Matched with Multiple Objective Lenses in Extreme Ultraviolet Lithography Machine
US-2017293230-A1 · Oct 12, 2017 · US
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Wang Yongtian — Physics
Wang Yongtian holds 3 patents in Physics, with representative filings summarized below.
| Metric | Value |
|---|---|
| Company | Wang Yongtian |
| Technology | Physics |
| Patents in slice | 3 |
| Recent patents in slice | 0 |
| First year | 2016 |
| Last year | 2017 |
Representative patents
Notable publications linking Wang Yongtian to Physics.
Adjustment and Design Method of Illumination System Matched with Multiple Objective Lenses in Extreme Ultraviolet Lithography Machine
US-2017293230-A1 · Oct 12, 2017 · US
Adjustment and Design Method of Illumination System Matched with Multiple Objective Lenses in Extreme Ultraviolet Lithography Machine
US-2017293230-A1 · Oct 12, 2017 · US
Adjustment and Design Method of Illumination System Matched with Multiple Objective Lenses in Extreme Ultraviolet Lithography Machine
US-2017293230-A1 · Oct 12, 2017 · US
Adjustment and Design Method of Illumination System Matched with Multiple Objective Lenses in Extreme Ultraviolet Lithography Machine
US-2017293230-A1 · Oct 12, 2017 · US
Recent filings
Latest patents from Wang Yongtian in Physics.
Adjustment and Design Method of Illumination System Matched with Multiple Objective Lenses in Extreme Ultraviolet Lithography Machine
US-2017293230-A1 · Oct 12, 2017 · US
Adjustment and Design Method of Illumination System Matched with Multiple Objective Lenses in Extreme Ultraviolet Lithography Machine
US-2017293230-A1 · Oct 12, 2017 · US
Adjustment and Design Method of Illumination System Matched with Multiple Objective Lenses in Extreme Ultraviolet Lithography Machine
US-2017293230-A1 · Oct 12, 2017 · US
Adjustment and Design Method of Illumination System Matched with Multiple Objective Lenses in Extreme Ultraviolet Lithography Machine
US-2017293230-A1 · Oct 12, 2017 · US
Adjustment and Design Method of Illumination System Matched with Multiple Objective Lenses in Extreme Ultraviolet Lithography Machine
US-2017293230-A1 · Oct 12, 2017 · US
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