Methods, systems and computer program products configured to adjust a critical dimension of reticle patterns used to fabricate semiconductor devices
US-10224178-B2 · Mar 5, 2019 · US
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Jung Yongseok — Electricity
Jung Yongseok holds 1 patent in Electricity, with representative filings summarized below.
| Metric | Value |
|---|---|
| Company | Jung Yongseok |
| Technology | Electricity |
| Patents in slice | 1 |
| Recent patents in slice | 0 |
| First year | 2019 |
| Last year | 2019 |
Representative patents
Notable publications linking Jung Yongseok to Electricity.
Methods, systems and computer program products configured to adjust a critical dimension of reticle patterns used to fabricate semiconductor devices
US-10224178-B2 · Mar 5, 2019 · US
Methods, systems and computer program products configured to adjust a critical dimension of reticle patterns used to fabricate semiconductor devices
US-10224178-B2 · Mar 5, 2019 · US
Methods, systems and computer program products configured to adjust a critical dimension of reticle patterns used to fabricate semiconductor devices
US-10224178-B2 · Mar 5, 2019 · US
Methods, systems and computer program products configured to adjust a critical dimension of reticle patterns used to fabricate semiconductor devices
US-10224178-B2 · Mar 5, 2019 · US
Recent filings
Latest patents from Jung Yongseok in Electricity.
Methods, systems and computer program products configured to adjust a critical dimension of reticle patterns used to fabricate semiconductor devices
US-10224178-B2 · Mar 5, 2019 · US
Methods, systems and computer program products configured to adjust a critical dimension of reticle patterns used to fabricate semiconductor devices
US-10224178-B2 · Mar 5, 2019 · US
Methods, systems and computer program products configured to adjust a critical dimension of reticle patterns used to fabricate semiconductor devices
US-10224178-B2 · Mar 5, 2019 · US
Methods, systems and computer program products configured to adjust a critical dimension of reticle patterns used to fabricate semiconductor devices
US-10224178-B2 · Mar 5, 2019 · US
Methods, systems and computer program products configured to adjust a critical dimension of reticle patterns used to fabricate semiconductor devices
US-10224178-B2 · Mar 5, 2019 · US
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