Method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices having patterned material layers with line-space dimensions of 50 nm and less
US-9184057-B2 · Nov 10, 2015 · US
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Oetter Guenter — Physics
Oetter Guenter holds 1 patent in Physics, with representative filings summarized below.
| Metric | Value |
|---|---|
| Company | Oetter Guenter |
| Technology | Physics |
| Patents in slice | 1 |
| Recent patents in slice | 0 |
| First year | 2015 |
| Last year | 2015 |
Representative patents
Notable publications linking Oetter Guenter to Physics.
Method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices having patterned material layers with line-space dimensions of 50 nm and less
US-9184057-B2 · Nov 10, 2015 · US
Method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices having patterned material layers with line-space dimensions of 50 nm and less
US-9184057-B2 · Nov 10, 2015 · US
Method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices having patterned material layers with line-space dimensions of 50 nm and less
US-9184057-B2 · Nov 10, 2015 · US
Method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices having patterned material layers with line-space dimensions of 50 nm and less
US-9184057-B2 · Nov 10, 2015 · US
Recent filings
Latest patents from Oetter Guenter in Physics.
Method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices having patterned material layers with line-space dimensions of 50 nm and less
US-9184057-B2 · Nov 10, 2015 · US
Method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices having patterned material layers with line-space dimensions of 50 nm and less
US-9184057-B2 · Nov 10, 2015 · US
Method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices having patterned material layers with line-space dimensions of 50 nm and less
US-9184057-B2 · Nov 10, 2015 · US
Method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices having patterned material layers with line-space dimensions of 50 nm and less
US-9184057-B2 · Nov 10, 2015 · US
Method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices having patterned material layers with line-space dimensions of 50 nm and less
US-9184057-B2 · Nov 10, 2015 · US
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