Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns
US-9665003-B2 · May 30, 2017 · US
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Hong Seung-Hee — Physics
Hong Seung-Hee holds 1 patent in Physics, with representative filings summarized below.
| Metric | Value |
|---|---|
| Company | Hong Seung-Hee |
| Technology | Physics |
| Patents in slice | 1 |
| Recent patents in slice | 0 |
| First year | 2017 |
| Last year | 2017 |
Representative patents
Notable publications linking Hong Seung-Hee to Physics.
Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns
US-9665003-B2 · May 30, 2017 · US
Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns
US-9665003-B2 · May 30, 2017 · US
Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns
US-9665003-B2 · May 30, 2017 · US
Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns
US-9665003-B2 · May 30, 2017 · US
Recent filings
Latest patents from Hong Seung-Hee in Physics.
Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns
US-9665003-B2 · May 30, 2017 · US
Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns
US-9665003-B2 · May 30, 2017 · US
Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns
US-9665003-B2 · May 30, 2017 · US
Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns
US-9665003-B2 · May 30, 2017 · US
Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns
US-9665003-B2 · May 30, 2017 · US
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