Nitrogen-containing monomer, polymer, resist composition, and patterning process
US-9207534-B2 · Dec 8, 2015 · US
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Kobayashi Tomohiro — Physics
Kobayashi Tomohiro holds 1 patent in Physics, with representative filings summarized below.
| Metric | Value |
|---|---|
| Company | Kobayashi Tomohiro |
| Technology | Physics |
| Patents in slice | 1 |
| Recent patents in slice | 0 |
| First year | 2015 |
| Last year | 2015 |
Representative patents
Notable publications linking Kobayashi Tomohiro to Physics.
Nitrogen-containing monomer, polymer, resist composition, and patterning process
US-9207534-B2 · Dec 8, 2015 · US
Nitrogen-containing monomer, polymer, resist composition, and patterning process
US-9207534-B2 · Dec 8, 2015 · US
Nitrogen-containing monomer, polymer, resist composition, and patterning process
US-9207534-B2 · Dec 8, 2015 · US
Nitrogen-containing monomer, polymer, resist composition, and patterning process
US-9207534-B2 · Dec 8, 2015 · US
Recent filings
Latest patents from Kobayashi Tomohiro in Physics.
Nitrogen-containing monomer, polymer, resist composition, and patterning process
US-9207534-B2 · Dec 8, 2015 · US
Nitrogen-containing monomer, polymer, resist composition, and patterning process
US-9207534-B2 · Dec 8, 2015 · US
Nitrogen-containing monomer, polymer, resist composition, and patterning process
US-9207534-B2 · Dec 8, 2015 · US
Nitrogen-containing monomer, polymer, resist composition, and patterning process
US-9207534-B2 · Dec 8, 2015 · US
Nitrogen-containing monomer, polymer, resist composition, and patterning process
US-9207534-B2 · Dec 8, 2015 · US
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