Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns
US-9665003-B2 · May 30, 2017 · US
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Kim Yun-Jun — Physics
Kim Yun-Jun holds 4 patents in Physics, with representative filings summarized below.
| Metric | Value |
|---|---|
| Company | Kim Yun-Jun |
| Technology | Physics |
| Patents in slice | 4 |
| Recent patents in slice | 0 |
| First year | 2015 |
| Last year | 2017 |
Representative patents
Notable publications linking Kim Yun-Jun to Physics.
Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns
US-9665003-B2 · May 30, 2017 · US
Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns
US-9665003-B2 · May 30, 2017 · US
Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns
US-9665003-B2 · May 30, 2017 · US
Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns
US-9665003-B2 · May 30, 2017 · US
Recent filings
Latest patents from Kim Yun-Jun in Physics.
Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns
US-9665003-B2 · May 30, 2017 · US
Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns
US-9665003-B2 · May 30, 2017 · US
Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns
US-9665003-B2 · May 30, 2017 · US
Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns
US-9665003-B2 · May 30, 2017 · US
Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns
US-9665003-B2 · May 30, 2017 · US
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