Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition
US-10345706-B2 · Jul 9, 2019 · US
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Hong Seung Hee — Physics
Hong Seung Hee holds 1 patent in Physics, with representative filings summarized below.
| Metric | Value |
|---|---|
| Company | Hong Seung Hee |
| Technology | Physics |
| Patents in slice | 1 |
| Recent patents in slice | 0 |
| First year | 2019 |
| Last year | 2019 |
Representative patents
Notable publications linking Hong Seung Hee to Physics.
Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition
US-10345706-B2 · Jul 9, 2019 · US
Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition
US-10345706-B2 · Jul 9, 2019 · US
Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition
US-10345706-B2 · Jul 9, 2019 · US
Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition
US-10345706-B2 · Jul 9, 2019 · US
Recent filings
Latest patents from Hong Seung Hee in Physics.
Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition
US-10345706-B2 · Jul 9, 2019 · US
Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition
US-10345706-B2 · Jul 9, 2019 · US
Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition
US-10345706-B2 · Jul 9, 2019 · US
Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition
US-10345706-B2 · Jul 9, 2019 · US
Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition
US-10345706-B2 · Jul 9, 2019 · US
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