Method and apparatus for reducing particle defects in plasma etch chambers
US-10658161-B2 · May 19, 2020 · US
Shen Meihua holds 2 patents in our database, with recent filings and technology areas summarized below.
| Metric | Value |
|---|---|
| Total patents | 2 |
| Recent patents | 0 |
| First publication | Jan 3, 2017 |
| Latest publication | May 19, 2020 |
Year-over-year patent counts for this assignee.
Latest publications where this party is an assignee.
Representative or frequently cited publications from precomputed assignee stats.
Most common classification codes in this portfolio.
| CPC | Patents |
|---|---|
| H01J37/32862 | 2 |
| H01J37/3244 | 1 |
| Y10S438/905 | 1 |
| B08B7/0035 | 1 |
| B08B5/00 | 1 |
Mapped technology topics for this assignee.
| Technology | Patents |
|---|---|
| Electricity | 2 |
| Operations & Transport | 1 |
| Chemistry & Metallurgy | 1 |
| Cross-Sectional Technologies | 1 |