Methods, systems and computer program products configured to adjust a critical dimension of reticle patterns used to fabricate semiconductor devices
US-10224178-B2 · Mar 5, 2019 · US
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Lee Donggun — Physics
Lee Donggun holds 2 patents in Physics, with representative filings summarized below.
| Metric | Value |
|---|---|
| Company | Lee Donggun |
| Technology | Physics |
| Patents in slice | 2 |
| Recent patents in slice | 0 |
| First year | 2015 |
| Last year | 2019 |
Representative patents
Notable publications linking Lee Donggun to Physics.
Methods, systems and computer program products configured to adjust a critical dimension of reticle patterns used to fabricate semiconductor devices
US-10224178-B2 · Mar 5, 2019 · US
Methods, systems and computer program products configured to adjust a critical dimension of reticle patterns used to fabricate semiconductor devices
US-10224178-B2 · Mar 5, 2019 · US
Methods, systems and computer program products configured to adjust a critical dimension of reticle patterns used to fabricate semiconductor devices
US-10224178-B2 · Mar 5, 2019 · US
Methods, systems and computer program products configured to adjust a critical dimension of reticle patterns used to fabricate semiconductor devices
US-10224178-B2 · Mar 5, 2019 · US
Recent filings
Latest patents from Lee Donggun in Physics.
Methods, systems and computer program products configured to adjust a critical dimension of reticle patterns used to fabricate semiconductor devices
US-10224178-B2 · Mar 5, 2019 · US
Methods, systems and computer program products configured to adjust a critical dimension of reticle patterns used to fabricate semiconductor devices
US-10224178-B2 · Mar 5, 2019 · US
Methods, systems and computer program products configured to adjust a critical dimension of reticle patterns used to fabricate semiconductor devices
US-10224178-B2 · Mar 5, 2019 · US
Methods, systems and computer program products configured to adjust a critical dimension of reticle patterns used to fabricate semiconductor devices
US-10224178-B2 · Mar 5, 2019 · US
Methods, systems and computer program products configured to adjust a critical dimension of reticle patterns used to fabricate semiconductor devices
US-10224178-B2 · Mar 5, 2019 · US
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